Ophthalmic characteristics measuring apparatus
US6695450B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 12, 2002 |
| Grant date | Feb 24, 2004 |
| Priority date | — |
| Expiry date | Nov 12, 2022 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61B3/10
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
There is provided an ophthalmic characteristic measuring apparatus in which when a wavefront measurement is carried out, an adjustment of an exposure amount, such as an exposure time or a light amount of a light source, is carried out. A first light source section emits light flux with a first wavelength. A first illumination optical system illuminates a minute area on a retina of a subject eye with the first flux from the first light source. A first light receiving optical system guides a part of light flux reflected and returned from the retina of the subject eye to a first light receiving section through a first conversion member for converting the reflected light flux into at least 17 beams. A second light source section emits light flux with a second wavelength. A second illumination optical system illuminates a predetermined area on the retina of the subject eye with the second light flux from the second light source section. A second light receiving optical system guides the second light flux reflected and returned from the retina of the subject eye to a second light receiving section. An arithmetic section determines an exposure amount of the first light receiving section o…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.