Apparatus for and method of vacuum vapor deposition and organic electroluminescent device
US6696096B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 21, 2001 |
| Grant date | Feb 24, 2004 |
| Priority date | — |
| Expiry date | Oct 31, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/24
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vacuum vapor deposition apparatus includes a vacuum chamber having a plurality of vapor sources and a heater for heating the vapor sources to achieve vacuum vapor deposition on a surface of at least one substrate within the vacuum chamber. At least one of the vapor sources utilizes an organic material. A hot wall, which encloses the vapor sources and a space in which the vapor sources and the substrate confront each other, is heated to a temperature at which the organic material is neither deposited nor decomposed. The organic material is vapor deposited on the surface of the substrate by heating the vapor sources while the vapor sources and the substrate are moved relative to each other.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.