Substrate and manufacturing method thereof
US6696225B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 16, 1999 |
| Grant date | Feb 24, 2004 |
| Priority date | — |
| Expiry date | Jul 16, 2019 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A method of manufacturing a substrate with a pattern showing hydrophilic property formed on a pattern surface comprising the steps of applying a silane coupling agent to the pattern surface of the base and forming a silane coupling film, forming a mask conforming to the pattern to be provided on the silane coupling film, and activating the silane coupling film provided with the mask by applying energy thereto in order to generate a polar group. In the regions where masking could not be performed, a polar group such as the hydroxyl group, carboxyl group, amino group, or amino carboxyl group is generated and shows hydrophilic property. The masked regions comprise hydrophobic property. This substrate functions as a universal substrate suitable for forming patterns with the inkjet system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.