Process and apparatus for cleaning a gas flow
US6696389B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 9, 1999 |
| Grant date | Feb 24, 2004 |
| Priority date | — |
| Expiry date | Sep 9, 2019 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S502/524
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
The invention relates to a method and a device for cleaning flowing gases. To reduce the total emissions, nitrogen oxides, especially NO and NOx, are extracted at least partially from the gas to be scrubbed, in the temperature range from 50 and 300° C., preferably between 50 and 150° C. To extract the nitrogen oxides, an intermediate storage medium is used that is composed of a storage material and a supporting material for the storage material. The intermediate storage medium having in particular a composition of the formal chemical formula Ag.CuAl2O4 in an Al2O3 matrix, with the composition being a spinel or being of the spinel type, and with the composition having characteristic spinel lines in the x-ray spectrum, where 0≦x<1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.