Modified antistatic compositions and thermally developable materials containing same
US6699648B2 · kind B2 · utility
6Cited by
20References
32Claims
0Family size
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Key dates
| Filing date | Mar 27, 2002 |
| Grant date | Mar 2, 2004 |
| Priority date | — |
| Expiry date | Mar 27, 2022 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/166
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Antistatic compositions include a fluorochemical that is a reaction product of Rf—CH2CH2—SO3H with an amine wherein Rf comprises 4 or more fully fluorinated carbon atoms. These antistatic compositions can be formulated in organic solvent-based conductive coating compositions, with or without hydrophobic binders, that can be used to form conductive layers in thermally developable materials including thermographic and photothermographic materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.