Photosensitive composition having uniform concentration distribution of components and pattern formation method using the same
US6703181B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 9, 1996 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | May 19, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
There is provided a photosensitive composition suitable for a resist material. This photosensitive composition has a high sensitivity and a high resolution with respect to a light source having a short wavelength, does not cause a phase separation in a film state, and makes it possible to stably form fine resist patterns. The photosensitive composition contains a polymer obtained by protecting an alkali-soluble group of an alkali-soluble polymer by a group which is unstable with respect to an acid, a compound which generates an acid upon being irradiated with light, at least one compound which is selected from the group consisting of an imidazole compound, an alanine compound, an adenine compound, an adenosine compound, and a quaternary ammonium salt compound, and which increases miscibility in a resist film, and a phenol compound.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.