Chemical modification of substrates by photo-ablation under different local atmospheres and chemical environments for the fabrication of microstructures
US6703189B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 13, 2001 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | Jul 13, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/146
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method for simultaneously forming microstructures in substrates and altering their chemical character. The method involves exposing a surface portion of a substrate to light source, which is strong enough and of the appropriate wavelength to cause ablation of the substrate. The ablation of the substrate is controlled to form microstructures therein, such as channels. The ablation is conducted under a chemical atmosphere, which causes a change in the chemical functionality of the microstructures. The chemical atmosphere can be a gas, liquid or solid that is provided on the substrate surface. The method can be used to fabricate or modify microfluidic systems.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.