Device and method for tempering at least one process good
US6703589B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 22, 2002 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | May 15, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method and for heat-treating at least one material being processed (3) under a specific process-gas atmosphere (111) of at least one process gas (4) with the aid of a heat-treatment unit (6). The heat-treatment unit has at least one energy source (5) for making the material being processed (3) take up an amount of energy, a heat-treatment container (11) with a heat-treatment space (16) for keeping the material being processed (3) under the process-gas atmosphere (111) during the heat treatment, a heat-treatment chamber (13), in which the heat-treatment container (11) is arranged at a distance (18) from the heat-treatment chamber (13), so that there is an intermediate space (14) between the heat-treatment container (11) and the heat-treatment chamber (13), and an element (19, 191) for producing in the intermediate space (14) a further gas atmosphere (141) of a further gas, different from the process-gas atmosphere (111).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.