Exposure apparatus and exposure method
US6704096B1 · kind B1 · utility
4Cited by
16References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2000 |
| Grant date | Mar 9, 2004 |
| Priority date | — |
| Expiry date | May 7, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11B7/0937
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
In an exposure apparatus and an exposure method, a disc master to be used in the preparation of an optical disc is applied to an exposure device, making it possible to perform exposure on a disc master for an optical disc which is substantially improved in recording density. An exposure laser beam by SHG having a wavelength of 300 nm or less is modulated by a modulator, and applied by near field effect to a disc master by using an objective lens having a numerical aperture of 1.0 or more.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.