Reduction of damage initiation density in fused silica optics via UV laser conditioning

US6705125B2 · kind B2 · utility

Assignee

• The Regents of the University of California · US

Inventors

• John Peterson · Sacramento, US
• Stephen M. Maricle · San Lorenzo, US
• Raymond M. Brusasco · Livermore, US
• Bernardino M. Penetrante · San Ramon, US

Key dates

• Filing date: Jul 26, 2001
• Grant date: Mar 16, 2004
• Expiry date: Aug 23, 2021

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C23/0025
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

The present invention provides a method for reducing the density of sites on the surface of fused silica optics that are prone to the initiation of laser-induced damage, resulting in optics which have far fewer catastrophic defects and are better capable of resisting optical deterioration upon exposure for a long period of time to a high-power laser beam having a wavelength of about 360 nm or less. The initiation of laser-induced damage is reduced by conditioning the optic at low fluences below levels that normally lead to catastrophic growth of damage. When the optic is then irradiated at its high fluence design limit, the concentration of catastrophic damage sites that form on the surface of the optic is greatly reduced.