Droplet deposition method and apparatus
US6705704B2 · kind B2 · utility
4Cited by
14References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 29, 2002 |
| Grant date | Mar 16, 2004 |
| Priority date | — |
| Expiry date | Apr 22, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB41J2202/20
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A droplet deposition apparatus includes an elongate chamber having a nozzle through which in operation droplets of liquid are ejected from the chamber for deposition, means for varying the pressure of liquid in the chamber by varying the volume thereof to effect ejection of the droplets and means for causing a flow of liquid in the chamber in addition to that necessary to replenish the ejected droplets, the flow passing across the nozzle to clean it.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.