Patent · US Expired

Method for creating an optical structure within a photosensitive light transmissive material and of enhancing the photosensitivity of the photosensitive light transmissive material

US6706455B1 · kind B1 · utility

2Cited by
3References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 3, 2002
Grant dateMar 16, 2004
Priority date
Expiry dateJan 3, 2022

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC03C25/6226
  • WIPO fieldMaterials, metallurgy
  • WIPO sectorChemistry

Abstract

A method of creating an optical structure within a photosensitive light transmissive material comprising the steps of: (a) exposing a selected region of the material to radiation at a wavelength selected to effect a refractive index change in the material; (b) terminating the exposure to the radiation at a selected fluence; and afterwards (c) exposing at least one portion of the selected region to UV radiation at a level sufficient to vary the refractive index of the material within the selected region to form the optical structure; wherein the fluence is selected such that the optical structure is substantially thermally stable without a requirement for post-processing annealing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.