Patent · US Expired

Polyetheresteramides and compositions of antistatic polymers containing the same

US6706851B1 · kind B1 · utility

10Cited by
1References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 17, 2001
Grant dateMar 16, 2004
Priority date
Expiry dateDec 7, 2021

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L101/00
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

The present invention relates to polyetheresteramides (B) containing polyamide blocks comprising dicarboxylic acid sulphonates either as polyamide-block chain limiters or combined with a diamine as one of the constituent monomers of the polyamide block, and containing polyether blocks consisting essentially of alkylene oxide units.The invention also relates to polyetheresteramides (B) containing polyamide blocks of the polyamide oligomer type of low molecular mass or of the copolyamide type which comprise dicarboxylic acid sulphonates and containing polyether blocks which are adducts of alkylene oxide with an aromatic diol.The invention also relates to antistatic or breathable polymer compositions comprising a thermoplastic polymer (A) and at least one of the above polyetheresteramides (B).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.