System for and method of designing and manufacturing a semiconductor device
US6708316B2 · kind B2 · utility
5Cited by
2References
22Claims
0Family size
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Key dates
| Filing date | Feb 21, 2001 |
| Grant date | Mar 16, 2004 |
| Priority date | — |
| Expiry date | Jul 2, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/36
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A system and method are provided for designing and manufacturing a semiconductor device, such as part of an integrated circuit. A template comprising a basic circuit diagram of a discrete circuit block and corresponding design equations are selected from a library. Desired performance parameters are selected and the value of one or more components of the circuit block are determined to allow the block to achieve the desired performance parameters.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.