Method and apparatus for verifying mask pattern data according to given rules
US6708323B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 7, 2001 |
| Grant date | Mar 16, 2004 |
| Priority date | — |
| Expiry date | Apr 29, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70433
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Pattern data of a designed circuit, including a plurality of feature data is verified according to given rules (S2). If feature data not meeting the rules exists, contents of the feature data are outputted as an error (S3), and if a designer considers the error is not problematic (false error) in view of characteristics of the circuit (S5), he inputs the error information indicating the error is false to add it to a file including the pattern data (S8). The file is read to perform processing on feature data to obtain exposure data for manufacturing a mask, and the feature data processed is verified according to given rules. If any feature data not meeting the rule exists, it is judged whether the contents of the feature data are included in the error information. If it is judged to be included, further judged whether the error is false. If false, the process is continued to repeat for the rest data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.