Apparatus for producing polishing solution and apparatus for feeding the same
US6709313B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 13, 2001 |
| Grant date | Mar 23, 2004 |
| Priority date | — |
| Expiry date | Jan 9, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B57/02
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Apparatus for producing a polishing solution composed of pure water and abrasive grains, the apparatus including a preparation tank to prepare a polishing solution containing abrasive grains at a predetermined concentration, by mixing an abrasive grain-containing slurry and pure water, and a circulation device for circulating the thus prepared polishing solution to keep the solution in a suspended state. The circulation device includes a circulation conduit and a flow-controllable bypass conduit fluidly associated with the circulation conduit providing a constant flow rate and having a light-extinction type particle detector for monitoring the polishing solution so as to detect large abrasive grains having a particle size not less than a predetermined value and measure the number of the large abrasive grains.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.