Substrate exposure apparatus and method
US6713219B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 21, 2002 |
| Grant date | Mar 30, 2004 |
| Priority date | — |
| Expiry date | Jun 21, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/704
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate exposure apparatus, having a line light source and a control system. The line light source has several point light sources. The control system converts the pattern into a timing signal to control the light status and dark status of each point light source. The control system also controls a scan light source to radiate the photoresist on the substrate, so that the photoresist is exposed. Further, in a substrate exposure method, multiple point light sources are arranged as at least one line light source to scan the photoresist once or several times to obtain a better resolution of the pattern transferred to the photoresist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.