Patent · US Expired

Vertical metal-semiconductor microresonator photodetecting device and production method thereof

US6713832B2 · kind B2 · utility

12Cited by
4References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 15, 2002
Grant dateMar 30, 2004
Priority date
Expiry dateJul 15, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10F30/2275

Abstract

Device for photodetection with a vertical metal semiconductor microresonator and procedure for the manufacture of this device.According to the invention, in order to detect an incident light, at least one element is formed over an insulating layer (2) that does not absorb this light, including a semiconductor material (6) and at least two electrodes (4) holding the element, with the element and electrode unit being suitable for absorbing this light and designed to incease the light intensity with respect to the incident light, in particular by making a surface plasmon mode resonate between the unit interfaces with the layer and the propagation medium for the incident light, with the resonance of this mode taking place in teh interface between the element and atleast one of the electrodes, with this mode being excited by the component of the magnetic field of the light, parallel to the electrodes. Application for optical telecommunications.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.