Method and apparatus for inspecting photosensitive material for surface defects
US6714296B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 21, 2002 |
| Grant date | Mar 30, 2004 |
| Priority date | — |
| Expiry date | Oct 21, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/8916
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
The surface defect inspection method and apparatus are capable of inspecting a photosensitive material for defective surface portions with efficiency by using a reflex-type optical sensor. The surface defect inspection apparatus has a reflex-type optical sensor. A thermal-developable photosensitive material is irradiated with inspection light from a light source. Reflected light from the photosensitive material is received by a light-receiving portion of the optical sensor and a defective surface portion is detected from the reflected light. A mask is attached to the light-receiving portion to cut out specular reflected light, thereby enabling a change in the quantity of diffuse reflected light to be directly detected. Therefore, even a defective surface portion where only a small diffuse reflectance is recognized can be detected with efficiency.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.