Process for producing a tube-shaped cathode sputtering target

US6719034B2 · kind B2 · utility

Assignee

• W.C. Heraeus GmbH & Co. KG · DE

Inventors

• Ralf Heck · Hanau, DE
• Rainer Jüttner · Hasselroth, DE
• David Francis Lupton · Gelnhausen, DE
• Egon Maier · Hasselroth, DE
• Peter Mainz · Ronneburg, DE
• Harald Manhardt · Bruchköbel, DE
• Bernd Stenger · Hammersbach, DE
• Holger Zingg · Bad Orb, DE

Key dates

• Filing date: Dec 19, 2001
• Grant date: Apr 13, 2004
• Expiry date: Dec 19, 2021

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C23C14/3414
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A process for producing a tube target for cathode sputtering plants, in which the tube target is formed from a metallic inner tube (target holder) made of a first material with a first melting point of Ts1≧900 K and a metallic outer tube (target) that concentrically surrounds the inner tube and that is made of a second material with a second melting point of Ts2≦800 K. The inside diameter of the outer tube and the outside diameter of the inner tube are proportioned in such a way that the two tubes fit together tightly and are mechanically firmly joined. The outer tube is formed by casting the second material in a molten state in a heated, vertical, cylindrical permanent mold, which has a heated mandrel that constitutes the inner tube. After a space between the mold and the inner tube has been filled with the molten second material, a first thermal gradient develops between the inner tube and the mold, a second thermal gradient develops between the bottom and the top of the mold, and the outer tube is simultaneously cooled from the inside to the outside and from the bottom to the top.