Apparatus and method for measuring static charge on wafers, disks, substrates, masks, and flat panel displays
US6719142B1 · kind B1 · utility
6Cited by
6References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 16, 2002 |
| Grant date | Apr 13, 2004 |
| Priority date | — |
| Expiry date | Jul 16, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67343
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Apparatus and method and system for measuring and controlling electrostatic charge on objects such as semiconductor substrates include a cassette having an inner structure with supporting slots and electrically conductive regions, and having isolated conductive outer walls for supporting objects in the slots, and include a charge monitor connected to the conductive regions and the conductive walls for sensing charge applicable to one or more objects carrying static charge positioned within the cassette. Charge neutralization is controlled in response to sensed charge attaining a selected level.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.