Jet-induced finishing of a substrate surface
US6719611B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 20, 2001 |
| Grant date | Apr 13, 2004 |
| Priority date | — |
| Expiry date | Dec 26, 2021 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24C3/22
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Jet-induced finishing of a substrate surface includes means for covering the surface with an abrasive liquid slurry and means for impinging a jet of fluid, either a gas or a liquid, against the slurry to create a high-shear work zone on the substrate surface whereby portions of the substrate are lifted and removed to alter the shape of the surface towards a predetermined shape and/or smoothness. The surface may be covered as by cascading a flowing layer of slurry over it or by impinging slurry onto the work zone or by immersing the substrate in a pool of the slurry. A nozzle for dispensing the jet fluid is precisely located at a predetermined distance and angle from the surface to be finished. A coarse removal function is provided by disposing the nozzle tip at a first distance from the substrate surface, and a fine removal function is provided by disposing the nozzle closer to the substrate surface. The invention is generally useful for finishing optical elements, and especially for inexpensive forming of microlenses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.