Chemical vapor deposition system
US6719848B2 · kind B2 · utility
39Cited by
25References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 16, 2001 |
| Grant date | Apr 13, 2004 |
| Priority date | — |
| Expiry date | Dec 27, 2021 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/54
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A chemical vapor deposition system (10) includes a housing (12) having an entry (30) and an exit (32) through which glass sheet substrates (G) to be coated are introduced and exited from a deposition chamber (14) defined by lower and upper housing portions (16, 18) having a seal assembly (22) at their horizontal junction which is higher than both the entry and the exit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.