Patent · US Expired

Light guide and stamper production method

US6719930B2 · kind B2 · utility

3Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 24, 2001
Grant dateApr 13, 2004
Priority date
Expiry dateApr 25, 2022

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG02B6/0055
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A production method of a light guide and a stamper, combining anisotropic etching and isotropic etching. First a plurality of microstructures is formed on a back surface and a front surface of the substrate. By electroforming, rear and front stampers are made from the back and front surfaces of the substrate. Light guides are produced using the rear and front stampers. Anisotropic etching is performed on the front surface of the substrate, forming V-shaped, U-shaped or pyramid like microstructures. Isotropic etching is performed on the back surface of the substrate, forming quadratic, bowl like, oval or semicircular microstructures. If a transparent substrate is used, then after finishing the etching of microstructures, a light source, a reflector, a diffusion sheet and a prism sheet are added, simulating a back light module for performing a test of luminosity, uniformity of light intensity and light emission angle, so that optical properties are known before proceeding with inverse-forming of the stampers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.