Method of fabricating high-dielectric color filter
US6720119B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2001 |
| Grant date | Apr 13, 2004 |
| Priority date | — |
| Expiry date | Oct 9, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/42
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a color filter with a small number of processes and at low cost is provided, for which a transparent conductive film for liquid crystal driving need not be formed, a voltage drop during liquid crystal driving is restrained, and a black matrix is easily formed; an apparatus for fabricating the color filter; the color filter; and a liquid crystal display apparatus. A color filter forming substrate on which a transparent conductive film and a transparent thin semiconductor film are provided on a transparent substrate in this order is brought into contact with an aqueous electrodeposition liquid, which contains a colorant, a transparent, high-dielectric material having a particle diameter of 100 nm or less, and a polymeric material that has cross-linkable groups in molecules and decreases in solubility and dispersibility for an aqueous liquid, depending on a change in pH, photoelectromotive force is produced by irradiating selected regions with light to form colored films in the selected regions, and thereby, a solvent-resistant and high-dielectric color filter is fabricated. Also, a color filter in which solvent-resistant and high-dielectric colored films are f…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.