Long working distance interference microscope
US6721094B1 · kind B1 · utility
186Cited by
12References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 5, 2001 |
| Grant date | Apr 13, 2004 |
| Priority date | — |
| Expiry date | Mar 5, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/22
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed is a long working distance interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. The long working distance of 10-30 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-D height profiles of MEMS test structures to be acquired across an entire wafer. A well-matched pair of reference/sample objectives is not required, significantly reducing the cost of this microscope, as compared to a Linnik microinterferometer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.