Echelon diffraction grating and optical waveguide element
US6721485B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 30, 2001 |
| Grant date | Apr 13, 2004 |
| Priority date | — |
| Expiry date | Apr 13, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/1852
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An echelon diffraction grating which has excellent heat resistance and can be produced at a low cost and an optical waveguide which has high heat resistance, small absorption of a communication wavelength of a near infrared range, and satisfies reliability and a low loss at an optical communication range.The echelon diffraction grating comprises a substrate, and an organopolysiloxane film having a maximum thickness of 1 &mgr;m to 1 mm formed on the surface of the substrate and has a plurality of steps having a predetermined width of 1 to 500 &mgr;m and a predetermined height of 5 to 500 &mgr;m formed on the organopolysiloxane film, and the organopolysiloxane film contains dimethylsiloxane and phenyl(or substituted phenyl)siloxane as essential ingredients.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.