Photodefinition of optical devices

US6724968B2 · kind B2 · utility

Assignee

• GEMFIRE CORPORATION · US

Inventors

• Hilary S. Lackritz · Rue de l'Église, US
• William K. Bischel · Menlo Park, US
• Tony C. Kowalczyk · Palo Alto, US
• Simon J. Field · Menlo Park, US
• Travis P. S. Thoms · San Lorenzo, US
• Yeong-Cheng Lee · Santa Clara, US

Key dates

• Filing date: Dec 1, 2000
• Grant date: Apr 20, 2004
• Expiry date: Dec 1, 2020

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/31504
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An optical structure is fabricated by forming an active layer including a photodefinable material on a substrate or on another underlying layer, forming an upper layer above the active layer, and then patterning the active layer by selective application of radiation through the upper layer. The upper layer is substantially transparent to radiation of the type required to activate the photodefinable material in the active layer.