Process for sterilization using an atmospheric pressure glow discharge plasma source
US6730238B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2000 |
| Grant date | May 4, 2004 |
| Priority date | — |
| Expiry date | Apr 10, 2021 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/288
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method for producing stable atmospheric pressure glow discharge plasmas using RF excitation and the use of said plasmas for modifying the surface layer of materials. The plasma generated by this process and its surface modification capability depend on the type of gases used and their chemical reactivity. These plasmas can be used for a variety of applications, including etching of organic material from the surface layer of inorganic substrates, as an environmentally benign alternative to industrial cleaning operations which currently employ solvents and degreasers, as a method of stripping paint from surfaces, for the surface modification of composites prior to adhesive bonding operations, for use as a localized etcher of electronic boards and assemblies and in microelectronic fabrication, and for the sterilization of tools used in medical applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.