Scanning probe system with spring probe and actuation/sensing structure

US6734425B2 · kind B2 · utility

Assignee

• Xerox Corporation · US

Inventors

• Thomas Hantschel · Houtvenne, BE
• Eugene M. Chow · Fremont, US
• David K. Fork · Mountain View, US
• Michel A. Rosa · San Jose, US
• Dirk De Bruyker · Palo Alto, US

Key dates

• Filing date: Apr 30, 2002
• Grant date: May 11, 2004
• Expiry date: Aug 21, 2022

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S977/873
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

Scanning probe systems, which include scanning probe microscopes (SPMs) are disclosed that include cantilevered spring (e.g., stressy metal) probes and actuation/position sensing electrodes formed on a substrate. The actuation electrodes are used to position the spring probe relative to the substrate using electrostatic, magnetic, acoustic, or piezoelectric arrangements. An actuation signal source is switched between full on and off states to facilitate “ON/OFF” probe actuation in which the spring probe is either fully retracted against the substrate or deployed for scan operations. The position sensing electrodes are used to sense the deflected position of the spring probe relative to the substrate using resistive, magnetic, or piezoresistive arrangements. Spring probe arrays are disclosed that include multiple spring probes arranged on a single substrate. Each spring probe of the array includes a separate actuation electrode that is controlled using “ON/OFF” or tapping probe actuation, and may include a separate position sensing electrode.