Method and a device for determining the radiation-damage resistance of an optical material
US6734970B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 21, 2002 |
| Grant date | May 11, 2004 |
| Priority date | — |
| Expiry date | Aug 21, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/386
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and a device for determining the resistance of an optical material to radiation damage, wherein several sample volumes (1a, 1b; 1211-1233) within the optical material are simultaneously irradiated with test radiation having differing, measured or preset radiant-energy densities. The radiation employed for all sample volumes comes from a common radiation source (3; 13) and at least one parameter indicative of the resistances to radiation damage of the irradiated sample volumes is measured using measuring radiation. The measuring radiation also comes from the same radiation source that supplies the test radiation and the material's resistance to radiation damage is determined based on a functional relation between its radiation-damage-resistance parameter and the radiant-energy densities, wherein that functional relation is determined using the values of the radiation-damage-resistance parameters measured for the various sample volumes for the various radiant-energy densities employed. Such a method and device have application, e.g., in determining the resistances of CaF2 and other optical materials to damage by ultraviolet laser radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.