Patent · US Expired

Apparatus and method for exposing a digital image onto a light-sensitive material

US6734993B1 · kind B1 · utility

3Cited by

11References

19Claims

0Family size

Assignee

Agfa-Fevaert Aktiengesellschaft · DE

Inventors

Tobias Damm · Hersbruck, DE
Friedrich Jacob · Munich, DE
Bernhard Lorenz · Marzling, DE
Knut Oberhardt · Holzkirchen, DE
Lothar Prause · Munich, DE
Gudrun Taresch · Munich, DE

Key dates

Filing date	Feb 1, 2000
Grant date	May 11, 2004
Priority date	—
Expiry date	Feb 1, 2020

Classification

Technology area (CPC G)Physics
CPC primaryG03B27/725
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A device and method are disclosed for exposing a digital image onto light-sensitive material. The device includes an image generation device that is controlled by a control device according to image data. In addition, the device has an optical system for reproducing the image onto light-sensitive material that is supported by a stage. A beam splitter, located in the exposure beam path, directs a portion of the light emitted by the image generation device onto a light sensor that has at least one sensor line.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.