Apparatus and method for vacuum coating deposition
US6736943B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2002 |
| Grant date | May 18, 2004 |
| Priority date | — |
| Expiry date | Mar 12, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/0216
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Vacuum coating deposition apparatus and methods employ a vacuum chamber with a superstructure to which deposition components in the vacuum chamber are mounted, such as a sputter target, substrate, etc. to provide a fixed relative position between them substantially unaffected by environmental and operating vibrations and flexure of the chamber wall. The superstructure is structurally independent of the deposition chamber wall and may be housed within the chamber or externally, extending from an external position to or through the wall of the deposition chamber. A meter of sensor, e.g., an optical monitor for measuring film thickness during deposition, continually monitors at least one parameter of the coating deposition and generates a corresponding control signal. A controller responsive to the control signal continually controls at least one process variable of the coating deposition in response to the control signal.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.