Substrate measuring method and device
US6737238B2 · kind B2 · utility
38Cited by
2References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 19, 2001 |
| Grant date | May 18, 2004 |
| Priority date | — |
| Expiry date | Jan 19, 2021 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T436/143333
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
To provide a method of making measurements for a sample on the measuring surfaces of a substrate which makes it possible to simplify the control and construction of a measuring device, shorten the measuring period, make the measuring conditions constant, and improve the positional accuracy. The method and a device for carrying out the method are characterized in that measurements for the sample is performed by forming a circular orbit of detection areas, where detection is performed with a detector, on the measuring surfaces of the substrate while moving the detection areas relative to the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.