Optical magnification adjustment system and projection exposure device
US6738195B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 7, 2002 |
| Grant date | May 18, 2004 |
| Priority date | — |
| Expiry date | Nov 26, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K3/0082
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An optical magnification adjustment system being capable of minutely correcting magnification. A first lens 1 of plano-convex is installed on the side of an object surface 5, and a second lens 2 of concave-plano is installed on the side of a formed image surface 7. By controlling the center space d between the first lens and the second lens, the image is enlarged or reduced. The radii of curvature R2 and R3 of the convex surface of the first lens and the concave surface of the second lens are respectively set according to the following equations.R2=(1−n1)/&phgr;2 R3=(n2−1)/&phgr;3 where, &phgr;2 and &phgr;3 represent optical power, andn1 and n2 represent refraction indexes, respectively.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.