Micromechanical structure, in particular for an acceleration sensor or yaw rate sensor and a corresponding method for producing the same

US6739193B2 · kind B2 · utility

Assignee

• Robert Bosch GmbH · DE

Inventors

• Jochen Franz · Reutlingen, DE
• Matthias Illing · Tübingen, DE
• Frank Henning · Reutlingen, DE
• Frank Fischer · Mesa, US
• Peter Hein · Bamberg, DE

Key dates

• Filing date: Oct 28, 2002
• Grant date: May 25, 2004
• Expiry date: Oct 28, 2022

Classification

• Technology area (CPC G): Physics
• CPC primary: G01P2015/0831
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A micromechanical structure and a corresponding manufacturing method. The structure includes a substrate, which includes an anchoring device, and a centrifugal mass, which is connected to the anchoring device via a flexible spring device, so that the centrifugal mass is elastically deflectable from its rest position. The centrifugal mass includes clearances and is configured to be deflectable by etching a sacrificial layer underneath it. The sacrificial layer is present in a first area located underneath the centrifugal mass with a first etchable thickness, and in a second area located underneath the centrifugal mass with a second etchable thickness, the second thickness is greater than the first thickness. The centrifugal mass is structured in the first area so that in etching only a maximum of two etching fronts may come together in order to limit the etching residue deposits.