Photoresist recirculation and viscosity control for dip coating applications
US6740163B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 19, 2001 |
| Grant date | May 25, 2004 |
| Priority date | — |
| Expiry date | Dec 26, 2021 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/16
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of performing dip coating of a layer of a resist material on a surface of a substrate, comprising steps of:(a) providing a dip coating vessel having an interior space containing a dip coating liquid comprising a solution of the resist material in a solvent, the dip coating vessel being open at the top thereof;(b) providing a substrate having a surface, immersing the substrate in the dip coating liquid in the vessel via the open top, and withdrawing the substrate from the vessel via the open top thereof, thereby forming a layer of resist material on the surface; and(c) monitoring and maintaining the viscosity of the dip coating liquid supplied to the dip coating vessel at a predetermined value.Also disclosed is an apparatus for performing the method.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.