Lateral MOS power transistor
US6740930B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2002 |
| Grant date | May 25, 2004 |
| Priority date | — |
| Expiry date | Jun 14, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/254
Abstract
A MOS power transistor formed in an epitaxial layer of a first conductivity type, the MOS power transistor being formed on the front surface of a heavily-doped substrate of the first conductivity type, including a plurality of alternate drain and source fingers of the second conductivity type separated by a channel, conductive fingers covering each of the source fingers and of the drain fingers, a second metal level connecting all the drain metal fingers and substantially covering the entire source-drain structure. Each source finger includes a heavily-doped area of the first conductivity type in contact with the epitaxial layer and with the corresponding source finger, and the rear surface of the substrate is coated with a source metallization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.