Method and system for manufacturing a photocathode
US6743074B1 · kind B1 · utility
0Cited by
17References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2001 |
| Grant date | Jun 1, 2004 |
| Priority date | — |
| Expiry date | Jun 15, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/04
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A system (10) for manufacturing a photocathode includes a support (12) and a polishing pad (14) disposed adjacent the support (12). The polishing pad (14) is operable to polish the photocathode in response to movable contact of the photocathode relative to the polishing pad (14). The system (10) also includes a rinsing system (16) coupled to the support (12). The rinsing system (16) is operable to deliver a rinsing agent to the polishing pad (14). The system (10) further includes a control system (62) operable to automatically regulate delivery of the rinsing agent to the rinsing system (16) at a predetermined time period.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.