Patent · US Expired

Apparatus for applying thin layers to a substrate

US6743341B2 · kind B2 · utility

2Cited by

2References

7Claims

0Family size

Assignee

Unaxis Deutschland GmbH · DE

Inventors

Joachim Szczyrbowski · Goldbach, DE
Gotz Teschner · Hanau, DE
Jurgen Bruch · Hammersbach, DE

Key dates

Filing date	Apr 22, 2002
Grant date	Jun 1, 2004
Priority date	—
Expiry date	Jun 22, 2022

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/347
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A process gas source (16) is connected to the vacuum chamber (5), and a metering valve (12) actuated by an automatic controller is installed between the vacuum chamber (5) and the process gas source (16). A potentiometric measurement electrode compares the amount of a gas in the vacuum chamber (5) with a reference gas by way of a reference electrode or with a solid body substituting for the reference electrode and sends a signal to automatic control unit (14), which contains a signal amplifier. The control unit then drives the generator of the power supply or the metering valve for the process gas.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.