Micro-electromechanical apparatus and method with position sensor compensation
US6744034B2 · kind B2 · utility
1Cited by
22References
20Claims
0Family size
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Key dates
| Filing date | Jan 30, 2002 |
| Grant date | Jun 1, 2004 |
| Priority date | — |
| Expiry date | Jan 31, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B26/02
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Micro-electromechanical apparatus and method with position sensor compensation to compensate for sensor drift. A preferred embodiment comprises modifying the intensity of a light source used in position detection to maintain a constant sum of the voltages output from photodetectors receiving light from the light source. Preferred embodiments may be implemented in digital signal processor code, or external to the processor in analog circuitry. By adjusting light source intensity, position calculations may be performed without normalization, and thus without a time-consuming division operation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.