Patent · US Expired

Reticle, and pattern positional accuracy measurement device and method

US6745484B2 · kind B2 · utility

5Cited by
4References
15Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 11, 2002
Grant dateJun 8, 2004
Priority date—
Expiry dateMar 11, 2022

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J2237/2482
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A positional accuracy measurement pattern is formed such that the position of an edge portion required to have high positional accuracy in a device pattern and the position of the pattern center of the positional accuracy measurement pattern are arranged on the same straight line in accordance with a direction in which the high positional accuracy is necessary. On the basis of the pattern center of the positional accuracy measurement pattern and the difference between the measurement value and the design value of the pattern dimension, the positional accuracy (the difference between the measurement value and the design value) of an edge portion of the device pattern is calculated.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.