MEMS device with controlled gas space chemistry
US6746886B2 · kind B2 · utility
45Cited by
2References
5Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 2002 |
| Grant date | Jun 8, 2004 |
| Priority date | — |
| Expiry date | Jun 4, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2201/042
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process for protecting a MEMS device used in a UV illuminated application from damage due to a photochemical activation between the UV flux and package gas constituents, formed from the out-gassing of various lubricants and passivants put in the device package to prevent sticking of the MEMS device's moving parts. This process coats the exposed surfaces of the MEMS device and package's optical window surfaces with a metal-halide film to eliminate this photochemical activation and therefore significantly extend the reliability and lifetime of the MEMS device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.