Vortex unit for providing a desired environment for a semiconductor process
US6750668B1 · kind B1 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 17, 2001 |
| Grant date | Jun 15, 2004 |
| Priority date | — |
| Expiry date | May 30, 2022 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67155
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A vortex unit suitable for providing a desired environment for a semiconductor process may include a vortex tube and a semiconductor processing device suitable for performing a semiconductor processing function. The vortex tube includes an air inlet for receiving compressed air, a first air exhaust for outputting an air stream having a temperature greater than the received compressed air, and a second air exhaust for outputting an air stream having a temperature lower than the received compressed air. The semiconductor processing device is connected to the second air exhaust of the vortex tube so that the semiconductor processing device receives a cooled air stream from the vortex tube, the cooled air stream providing an environment suitable for enabling the semiconductor processing device to perform the semiconductor processing function.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.