Single aperture optical system for photolithography systems
US6757052B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 6, 2002 |
| Grant date | Jun 29, 2004 |
| Priority date | — |
| Expiry date | Aug 9, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70183
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and apparatus for varying the number and intensity of beams of a photo-lithographic light source for exposing photoresist materials include beam dividers and beam focusing means. Methods include producing an incident light beam having uniform intensity distribution, refracting the incident light beam into a plurality of divergent beams, refracting the plurality of divergent beams into a plurality of parallel beams, and exposing an object with light of the plurality of parallel beams. Apparatus includes source of light beam having uniform intensity distribution, first refracting element for refracting the light beam into a plurality of divergent beams, second refracting element for refracting the plurality of divergent beams into a plurality of parallel beams, and means for exposing the object with light of the plurality of parallel beams. Variations in the separations of the refractive elements allows for the control of the size, shape, and dispersion patterns of resultant beams.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.