Method of writing ferroelectric field effect transistor
US6760246B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | May 1, 2002 |
| Grant date | Jul 6, 2004 |
| Priority date | — |
| Expiry date | May 1, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C11/22
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A ferroelectric field effect transistor (FET) has a gate, source, drain, and substrate. A negative voltage is applied to the gate. Ground potential is applied to the source, drain, and substrate. The negative voltage has a magnitude at least equal to the coercive voltage of the FET. A positive voltage is then applied to the gate. Ground potential is applied to the source and substrate. The positive voltage is no less than the coercive voltage. Either a positive voltage or a ground potential is applied to the drain to write a logic state to the FET. A voltage is applied to the gate. Ground potential is applied to the source. A positive voltage is applied to the drain. The drain current is measured and compared to a compare current. The relative size of the drain current compared to the compare current is indicative of the stored logic state in the FET.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.