Patent · US Expired

Dispersion containing pyrogenically manufactured abrasive particles with superparamagnetic domains

US6761747B2 · kind B2 · utility

14Cited by

5References

26Claims

0Family size

Assignee

Degussa AG · DE

Inventors

Heiko Gottfried · Straubing, DE
Markus Pridoehl · Großkrotzenburg, DE
Berthold Trageser · Alzenau, DE
Guido Zimmermann · Hanau, DE
Stefan Heberer · Gelnhausen, DE
Heike Muehlenweg · Nidderau, DE

Key dates

Filing date	Oct 24, 2002
Grant date	Jul 13, 2004
Priority date	—
Expiry date	Oct 24, 2022

Classification

Technology area (CPC H)Electricity
CPC primaryH01F1/44
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An aqueous dispersion containing abrasive particles comprises abrasive particles having superparamagnetic metal oxide domains in a non-magnetic metal oxide or non-metal oxide matrix. The abrasive particles of the aqueous dispersion can have an average particle size of below 400 nm and a BET surface area of 50 to 600 m2/g. The dispersion can be produced by dispersing the abrasive particles with an energy of at least 200 kJ/m3 using a device in which the abrasive particles are first subjected to high pressure, then decompressed through a nozzle so that the abrasive particles collide with one another or against sections of wall in the device. The aqueous dispersion can be used for chemical mechanical polishing (CMP).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.