Methods and systems for controlling the concentration of a component in a composition with absorption spectroscopy
US6762832B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 21, 2002 |
| Grant date | Jul 13, 2004 |
| Priority date | — |
| Expiry date | Oct 16, 2022 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/3155
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided are methods and systems for controlling the concentration of a component in a composition, and semiconductor processing methods and systems. One exemplary method of controlling the concentration of a component in a composition involves: providing a composition which has a liquid portion, wherein the liquid portion contains a component to be monitored; performing an absorption spectroscopy measurement on a sample of the composition; and controlling the concentration of the component in the composition based on the absorption spectroscopy measurement using a feedback control loop. The invention allows for controlling the concentration of a component in a composition, for example, a corrosion inhibitor in a chemical planarization (CMP) chemical, as well as in pre- and post-CMP storage/treatment chemicals, and can provide real time, accurate process control in a simple and robust manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.