Gas sensors using SiC semiconductors and method of fabrication thereof
US6763699B1 · kind B1 · utility
15Cited by
22References
33Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 6, 2003 |
| Grant date | Jul 20, 2004 |
| Priority date | — |
| Expiry date | Feb 6, 2023 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N27/129
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Gas sensor devices are provided having an atomically flat silicon carbide top surface that, in turn, provides for a uniform, and reproducible surface thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.