Monitoring device and method for operating clean-in-place system
US6767408B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 18, 2002 |
| Grant date | Jul 27, 2004 |
| Priority date | — |
| Expiry date | Dec 18, 2022 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B9/0325
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method for cleaning an apparatus using a clean-in-place system is disclosed. The clean-in-place system is in fluid communication with an inlet and an outlet of the apparatus. In the method, a cleaning composition having a measurable physical property (e.g., pH) is supplied from a cleaner tank into the inlet of the apparatus for a first period of time. A rinsing composition having the measurable physical property at a second measured value is then supplied from a rinse tank into the inlet of the apparatus for a second period of time. The measurable physical property is sensed versus time for fluids exiting the outlet of the apparatus, and a circulation time of the cleaning composition is determined. A closing time for a return valve of the cleaner tank is then determined for subsequent cleaning cycles such that minimal rinsing composition enters the cleaner tank during the subsequent cleaning cycle.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.